Detergent, Teknon Microcleanse

• Ultra low residue
• Non foaming
• Ultrasonic compatible
• Solvent free
• Non-caustic

Application:
An ultra low residue detergent for micro-electronics, semiconductor and precision engineering industries

This detergent is phosphate and enzyme free and rapidly disperses organic matter, particulates and chemical deposits. The most effective cleanig is achieved by using a 2.5% solution in warm water through an ultrasonic bath, or spray cleaning machine, followed by a rinse cycle. Microcleanse is highly effective at removing deposits and is free rinsing, containing no substantive components.